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Optical System.Lens & Illumination

RSoft PIC Suite v2020(OptoDesigner)

RSoft PIC Suite OptoDesigner RSOFT Photonics CAD BeamPROP FullWAVE BandSOLVE GratingMOD DiffractMOD FemSIM ModePROP

cadcamaec@protonmail.com2023-09-15Optical System.Lens & Illumination145

ThePhotonicChipandMaskLayouttoolisthedesigncockpitofSynopsysOptoDesignerforcreatingP

The Photonic Chip and Mask Layout tool is the design cockpit of Synopsys OptoDesigner for creating PIC designs, when a designer likes to work in a layout-driven flow. This module is also the cockpit to adjust a design, when the PIC schematic has been captured and simulated with Synopsys OptSim Circuit.

The environment supports hierarchy and re-use of components. Start your design by selecting elements from extensive supplied libraries. Then, create your own parameterized building blocks. The connectivity between elements is automatically maintained when you make changes elsewhere. Once your design is finished, the powerful discretization engine generates final mask data in one of the many supported export formats.

Add-on modules provided in Synopsys OptoDesigner can be used to perform many types of simulations on your PIC designs. Other modules automate repetitive tasks to make you more productive. Synopsys OptoDesigner and its modules deliver an unmatched PIC design environment.

Benefits

Efficient, comprehensive PIC design environment
Fewer errors
Improved design productivity
Infrastructure for your organization to capture and reuse knowledge
Many supported foundry PDKs, access to many technologies
Reliable and mature solution used in more than 500 tape-outs in the last three years

Applications

Synopsys OptoDesigner can be used to design PICs for any technology, for a range of industries including telecom, datacom, sensing, and biomedical.

Features

All angle connectivity to ensure components will stay connected when they need to be
Easy to design and customize curved elements
Extensive libraries with many primitives and components
Powerful scripting language to automate all your design tasks
Unlimited levels of hierarchy, simplifying design reuse
Define your own PDK or use one of the many available foundry PDKs
The use of Design Intent to simplify mask data generation. Design Intent ensures that users can design in a single layer (the design intent layer) and that the software generates all the different mask layers needed for actual production
Technology-agnostic method for defining elements. Ability to port the same design between different technologies
Powerful add-on simulation modules for mode calculations and propagation calculations
Import and export to formats such as GDSII and CIF
Ability to define your own GDS libraries using extensive caching capabilities
Many interfaces to third-party tools